1st Edition
Handbook of Thin Film Process Technology 98/1 Reactive Sputtering
By David A Glocker
Copyright 1998
90 Pages
by
CRC Press
90 Pages
by
CRC Press
Also available as eBook on:
The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.
1. Physical Depositon Techniques 2. Chemical Depositon Techniques 3. Processing Technologies 4. Real-Time Diagnostics 5. Surface Modification in Vacuum 6. Superlattices and Multi-Layered Structures 7. Materials
Biography
David A Glocker