With the constant emergence of new research and application possibilities, gaseous electronics is more important than ever in disciplines including engineering (electrical, power, mechanical, electronics, and environmental), physics, and electronics.
The first resource of its kind, Gaseous Electronics: Tables, Atoms, and Molecules fulfills the author’s vision of a stand-alone reference to condense 100 years of research on electron-neutral collision data into one easily searchable volume. It presents most—if not all—of the properly classified experimental results that scientists, researchers, and students require for a theoretical and practical understanding of collision properties and their impact.
An unprecedented collection and analysis of electron neutral collision properties
This book follows a new user-friendly format that enables readers to easily retrieve, analyze, and apply specific atomic/molecular information as needed. In his previous work, Gaseous Electronics: Theory and Practice, the author first explored electron–neutron interactions. To clarify the complex fundamental processes involved, he cited as much experimental data on atoms and molecules as limited space would allow. Completing that task, this handy reference more fully compiles essential revised data on more than 420 atoms and molecules, arranging it into easily digestible chapters, sections, and appendices. Analysis parameters include total scattering, ionization, excitation, attachment cross sections, ionization and attachment coefficients, attachment rates, and ion drift velocity.
Some recent research areas in gaseous electronics include:
- Environmentally efficient and protective lighting devices
- Plasma research for power generation and space applications
- Medical applications (some involving skin treatment and healing)
Written entirely in SI units, the book includes hundreds of tables, figures, and specially drawn charts, with data expressed in both tabular and graphical form. Each chapter stands independently and contains references for further research.
Section I: 1 Atom
Argon (Ar)
Cesium (Cs)
Helium (He)
Krypton (Kr)
Mercury (Hg)
Neon (Ne)
Potassium (K)
Sodium (Na)
Xenon (Xe)
Section II: 2 Atoms
Bromine (Br2)
Carbon Monoxide (CO)
Chlorine (Cl2)
Deuterium (D2)
Deuterium Bromide (DBr)
Deuterium Chloride (DCl)
Deuterium Iodide (DI)
Fluorine (F2)
Hydrogen (H2)
Hydrogen Bromide (HBr)
Hydrogen Chloride (HCl)
Hydrogen Fluoride (HF)
Hydrogen Iodide (HI)
Iodine (I2)
Nitric Oxide (NO)
Nitrogen (N2)
Oxygen (O2)
Section III: 3 Atoms
Carbon Dioxide (CO2)
Carbon Disulfide (CS2)
Carbon Oxysulfide (COS)
Chlorine Dioxide (ClO2)
Heavy Water (D2O)
Hydrogen Sulfide (H2S)
Nitrogen Dioxide (NO2)
Nitrous Oxide (N2O)
Ozone (O3)
Sulfur Dioxide (SO2)
Water Vapor (H2O)
Section IV: 4 Atoms
Acetylene (C2H2)
Ammonia (NH3)
Boron Trichloride (BCl3)
Boron Trifluoride (BF3)
Deuterated Ammonia (ND3)
Nitrogen Trifluoride (NF3)
Phosphine (PH3)
Phosphorous Trifluoride (PF3)
Section V: 5 Atoms
Bromochloromethane (CH2BrCl)
Bromomethane (CH3Br)
Bromotrichloromethane (CBrCl3)
Bromotrifluoromethane (CBrF3)
Carbon Tetrachloride (CCl4)
Chlorodibromomethane (CHBr2Cl)
Chloromethane (CH3Cl)
Chlorotrifluoromethane (CClF3)
Deuterated Methane (CD4)
Dibromodifluoromethane (CBr2F2)
Dibromomethane (CH2Br2)
Dichlorodifluoromethane (CCl2F2)
Dichloromethane (CH2Cl2) and Difluoromethane (CH2F2)
Fluoromethane (CH3F)
Formic Acid (CH2O2)
Germane (GeH4)
Germanium Tetrachloride (GeCl4)
Iodomethane (CH3I)
Methane (CH4)
Silane (SiH4)
Silicon Tetrafluoride (SiF4)
Sulfuryl Fluoride (SO2F2)
Tetrabromomethane (CBr4)
Tetrachlorosilane (SiCl4)
Tetrafluoromethane (CF4)
Tribromofluoromethane (CBr3F)
Tribromomethane (CHBr3)
Trichlorofluoromethane (CCl3F)
Trichloromethane (CHCl3)
Trifluoromethane (CHF3)
Section VI: 6 Atoms
Dibromoethene (C2H2Br2)
Dichloroethene (C2H2Cl2)
Ethylene (C2H4)
Methanethiol (CH3SH)
Methanol (CH3OH)
Tetrachloroethene (C2Cl4)
Tetrafluoroethene (C2F4)
Tribromoethene (C2HBr3)
Trichloroethene (C2HCl3)
Section VII: 7 Atoms
Allene (C3H4)
Cyclopropene (C3H4)
Ethanal (C2H4O)
Methylamine (CH3NH2)
Propyne (C3H4)
Sulfur Hexafluoride (SF6)
Tungsten Hexafluoride (WF6)
Uranium Hexafluoride (UF6)
Section VIII: 8 Atoms
Bromofluoroethane (C2H4BrF)
Bromotrifluoroethane (C2H2BrF3)
Chloroethane (C2H5Cl)
Dibromodifluoroethane (C2H2Br2F2)
Dibromoethane (C2H4Br2)
Dibromotetrafluoroethane (C2Br2F4)
Dichloroethane (C2H4Cl2)
Disilane (Si2H6)
Ethane (C2H6)
Hexachloroethane (C2Cl6)
Hexafluoroethane (C2F6)
Pentachloroethane (C2HCl5)
Tetrabromoethane (C2H2Br4)
Tetrachloroethane (C2H2Cl4)
Tribromoethane (C2H3Br3)
Trichloroethane (C2H3Cl3)
1,1,1-Trifluoroethane (C2H3F3)
Section IX: 9 Atoms
Hexafluoropropene (1-C3F6)
Propylene (C3H6) and Cyclopropane (c-C3H6)
Section X: 10 Atoms
Acetone (C3H6O)
Cyclobutene (C4H6), 1,3-Butadiene (1,3-C4H6), 2-Butyne (2-C4H6)
Hexafluorocyclobutene (C4F6), Hexafluoro-1,3-Butadiene (1,3-C4F6), and Hexafluoro-2-Butyne (2-C4F6)
Section XI: 11 Atoms
Chloropropane (C3H7Cl)
Perfluoropropane (C3F8)
Propane (C3H8)
Section XII: 12 Atoms
Benzene (C6H6) and Deuterated Benzene (C6D6)
Bromobenzene (C6H5Br)
Butene (C4H8)
Chlorobenzene (C6H5Cl)
Chloropentafluorobenzene (C6F5Cl)
1,3-Difluorobenzene (1,3-C6H4F2)
1,4-Difluorobenzene (C6H4F2)
Fluorobenzene (C6H5F)
Hexafluorobenzene (C6F6)
Iodobenzene (C6H5I)
Perfluorocyclobutane (c-C4F8), Perfluoro-2-Butene (2-C4F8), and Perfluoroisobutene (i-C4F8)
1-Propanol (1-C3H8O) and 2-Propanol (2-C3H8O)
Section XIII: More than 12 Atoms
Butane (C4H10)
Chlorobutane (C4H9Cl), 1-Chlorobutane (1-C4H9Cl), 2-Chlorobutane (2-C4H9Cl), and t-Chlorobutane (t-C4H9Cl)
Chloropentane (C5H11Cl)
Cyclopentane (C5H10)
Hexane (C6H14) and Cyclohexane (C6H12)
Isobutane (i-C4H10)
Isooctane (i-C8H18)
Octane (C8H18)
Pentane (C5H12)
Perfluorobutane (n-C4F10) and Perfluoroisobutane (i-C4F10)
Tetrahydrofuran (C4H8O) and α-Tetrahydrofurfuryl Alcohol (C5H10O2)
Toluene (C7H8)
Section XIV: Gas Mixtures
Air
Section XV: Appendices
Appendix 1: Fundamental Constants
Appendix 2: Target Particles (Namewise)
Appendix 3: Target Particles (Formulawise)
Appendix 4: Attachment Peaks and Cross Sections
Appendix 5: Attachment Rates
Appendix 6: Atomic Ionization Cross Sections
Appendix 7: Ionization Cross Sections—Molecules
Appendix 8: Important Relationships
Appendix 9: Quadrupole Moments of Target Particles
Appendix 10: Relative Dielectric Strength of Gases
Biography
Professor Gorur Govinda Raju obtained a BEng degree from the University of Bangalore (India) and a Ph.D from the University of Liverpool (England) in 1963. He joined the University of Windsor (Canada) in 1980 and became professor and head of the Electrical and Computer Engineering Department during 1989–97 and 2000–2002. He has been on the board and program committee of the Conference on Electrical Insulation and Dielectric Phenomena (IEEE) for a number of years, and he is currently an emeritus professor at the University of Windsor. Professor Raju has been a consultant on electrical power and dielectric phenomena to the government of India, Detroit Edison Co., and several other industries. He has published three previous book, as well as more than 140 papers in international journals and conferences. His experimental and theoretical contributions to gaseous electronics continue to be cited in research papers on this topic.
"Readers working in the areas of plasma processing or plasma/arc related technology will find this book a useful reference source for values of various plasma parameters. … a very useful reference book for hard-to-find information on gaseous electronic parameters."
—IEEE Electrical Insulation Magazine