Chemical Vapour Deposition (CVD): Advances, Technology and Applications

1st Edition

Kwang-Leong Choy

CRC Press
Published March 25, 2019
Reference - 398 Pages - 419 B/W Illustrations
ISBN 9781466597761 - CAT# K20853
Series: Series in Materials Science and Engineering

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This book offers a timely and complete overview on chemical vapour deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. Chapters discuss key aspects, from processing, material structure and properties to practical use, cost considerations, versatility, and sustainability. The author presents a comprehensive overview of CVD and its potential in producing high performance, cost-effective nanomaterials and thin and thick films.


  • Provides an up-to-date introduction to CVD technology for the fabrication of nanomaterials, nanostructured films, and composite coatings
  • Discusses processing, structure, functionalization, properties, and use in clean energy, engineering, and biomedical grand challenges
  • Covers thin and thick films and composites
  • Compares CVD with other processing techniques in terms of structure/properties, cost, versatility, and sustainability

Kwang-Leong Choy is the Director of the UCL Centre for Materials Discovery and Professor of Materials Discovery in the Institute for Materials Discovery at the University College London. She earned her D.Phil. from the University of Oxford, and is the recipient of numerous honors including the Hetherington Prize, Oxford Metallurgical Society Award, and Grunfeld Medal and Prize from the Institute of Materials (UK). She is an elected fellow of the Institute of Materials, Minerals and Mining, and the Royal Society of Chemistry.


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