Plasma Processing of Nanomaterials

Plasma Processing of Nanomaterials

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Features

  • Describes existing challenges to synthesizing well-defined nanomaterials and subsequent applications
  • Explains the art and science of plasma-based chemical processes
  • Provides examples of how plasma technology can be used to synthesize various classes of nanomaterials (e.g. nanoparticles, carbon nanotubes, and semiconductor nanowires)
  • Explores the outlook for the future potential of plasma-based processes in nanomaterials synthesis
  • Offers contributions from world-renowned leaders in plasma processing of nanomaterials

Summary

We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress.

Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits.

An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of:

  • Nanoscale etching/deposition of thin films
  • Catalytic growth of carbon nanotubes and semiconductor nanowires
  • Silicon nanoparticle synthesis
  • Functionalization of carbon nanotubes
  • Self-organized nanostructures

 

Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work.


About the Author:

R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.

Table of Contents

Nanoscale Etching and Deposition, N. Marchack and J.P. Chang

Extreme Ultraviolet Light Lithography for Producing Nanofeatures in Next-Generation Semiconductor Processing, J. Sporre and D.N. Ruzic

Nonthermal Plasma Synthesis of Semiconductor Nanocrystals, U. Kortshagen and L. Mangolini

Microscale Plasmas for Metal and Metal Oxide Nanoparticle Synthesis, D. Mariotti and R. Mohan Sankaran

Large-Scale, Plasma-Assisted Growth of Nanowires, U. Cvelbar and M.K. Sunkara

Cathodic Arc Discharge for Synthesis of Carbon Nanoparticles, M. Chhowalla and H. Emrah Unalan

Atmospheric Plasmas for Carbon Nanotubes (CNTs), J. Beom Park, S.J. Kyung, and G. Young Yeom

Structural Control of Single-Walled Carbon Nanotubes by Plasma Chemical Vapor Deposition, R. Hatakeyama and T. Kato

Graphene Growth by Plasma-Enhanced Chemical Vapor Deposition (PECVD), M. Meyyappan and J.-S. Lee

Modeling Aspects of Plasma-Enhanced Chemical Vapor Deposition of Carbon-Based Materials, E. Neyts, M. Mao, M. Eckert, and A. Bogaerts

Modeling Catalytic Growth of One-Dimensional Nanostructures, E. Tam, K. Ostrikov, and T. Murphy

Diagnostics of Energy Fluxes in Dusty Plasmas, H.R. Maurer and H. Kersten

Selective Functionalization and Modification of Carbon Nanomaterials by Plasma Techniques, Y. Xu and L. Dai

Plasma–Liquid Interactions for Fabrication of Nanobiomaterials, T. Kaneko and R Hatakeyama

Assembly and Self-Organization of Nanomaterials, A.E. Rider and K. Ostrikov

Editor Bio(s)

R. Mohan Sankaran is an Associate Professor of Chemical Engineering at Case Western Reserve University (CWRU) in Cleveland, Ohio. He received his Bachelor’s degree in Chemical Engineering from the University of California at Los Angeles in 1998 and his Ph.D. in Chemical Engineering from the California Institute of Technology in 2004. He joined the Department of Chemical Engineering at CWRU in 2005 as the John C. Angus Legacy Assistant Professor. As a faculty member, he has received several awards, including the CAREER Award from the National Science Foundation, the Young Investigator Program Award from the Air Force Office of Scientific Research, the Camille Dreyfus Teacher-Scholar Award, the Case School of Engineering Research Award, and the Peter Mark Memorial Award from the American Vacuum Society. He is recognized worldwide for his work on atmospheric-pressure microplasmas and their application in nanomaterials synthesis.

Dr. Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.

Editorial Reviews

CRC Press author R. Mohan Sankaran is the winner of the 2011 Peter Mark Memorial Award "… for the development of a tandem plasma synthesis method to grow carbon nanotubes with unprecedented control over the nanotube properties and chirality."
2011 AVS Awards Committee

"Readers who want to learn about how nanomaterials are processed, using the most recent methods, will benefit greatly from this book. It contains very recent technical details on plasma processing and synthesis methods used by current researchers developing new nano-based materials, with all the major plasma-based processing techniques used today being thoroughly discussed."
—John J. Shea, IEEE Electrical Insulation Magazine, May/June 2013, Vol. 29, No. 3

 
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