Microlithography: Science and Technology, Second Edition

Published:
May 11, 2007 by CRC Press - 864 Pages
Editor(s):
Kazuaki Suzuki; Kazuaki Suzuki, Nikon Corporation, Tokyo, Japan; Bruce Smith; Bruce W. Smith, Rochester Institute of Technology, New York, USA

Purchasing Options

Hardback
$165.95
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ISBN 9780824790240
Cat# DK2278
 

Features

  • Provides a complete picture of microlithography, from fundamental physics and chemistry to industrial applications
  • Offers contributions from active experts who are pioneering developments at the forefront of the field
  • Covers optics, light sources, alignment techniques, resist chemistry, processing, metrology, and multilayer methods
  • Updates coverage to include recently developed techniques and looks toward future generations of technologies

    • Summary

    This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts.

    New in the Second Edition
    In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including…

  • Immersion Lithography
  • 157nm Lithography
  • Electron Projection Lithography (EPL)
  • Extreme Ultraviolet (EUV) Lithography
  • Imprint Lithography
  • Photoresists for 193nm and Immersion Lithography
  • Scatterometry

    Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition.

    Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

    • Table of Contents

    EXPOSURE SYSTEM
    System Overview of Optical Steppers and Scanners; Michael S. Hibbs
    Optical Lithography Modeling; Chris A. Mack
    Optics for Photolithography; Bruce W. Smith
    Excimer Laser for Advanced Microlithography; Palash Das
    Alignment and Overlay; Gregg M. Gallatin
    Electron Beam Lithography System; Kazuaki Suzuki
    X-Ray Lithography; Takumi Ueno
    EUV Lithography; Stefan Wurm and Charles Gwyn
    Imprint Lithography; Douglas J. Resnick
    RESISTS AND PROCESSING
    Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen
    Resist Processing; Bruce W. Smith
    Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty
    Dry Etching of Photoresists; Roderick R. Kunz
    METROLOGY AND NANOLITHOGRAPHY
    Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur
    Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar
    Index

    Editorial Reviews

    About the first edition…
    "…The editors have done an excellent job of gathering the knowledge of a number of world experts and blending it into a harmonious whole which will serve as a reference for some time to come, even in this fast-moving field."
    -International Journal of Electrical Engineering Education

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