Describes the fundamental principles of the techniques

Discusses major sample preparation, contamination, and routine maintenance issues

Compares ICP-MS to other trace element techniques in terms of detection capability, dynamic range, and more

Includes new glossary of terminology and equipment features

Presents user-friendly selection criteria when evaluating commercial ICP-MS equipment

The Practical Guide to ICP-MS, Second Edition presents an in-depth discussion of the fundamental principles, analytical advantages, and practical capabilities of ICP-MS. It offers key concepts in a reader-friendly format suitable for those with limited knowledge of the technique. This edition features new and updated coverage of hyphenated techniques, particularly LC-ICP-MS, collision/reaction cell technology, and ICP-MS applications in the environmental, semiconductor, metallurgical, and petrochemical industries. It also provides selection criteria for commercial ICP-MS equipment and a new glossary containing ICP-MS terms as well as specifications and features for commercial equipment.

An Overview of ICP Mass Spectrometry

Principles of Ion Formation

Sample Introduction

Aerosol

Plasma Source

Interface Region

Ion-Focusing System

Mass Analyzers: Quadrupole Technology

Mass Analyzers: Double-Focusing Magnetic Sector Technology

Mass Analyzers: Time-of-Flight Technology

Mass Analyzers: Collision/Reaction Cell and Interface Technology

Ion Detectors

Peak Measurement Protocol

Measurement

Methods of Quantitation

Review of Interferences

Contamination Issues Associated with Sample Preparation

Routine Maintenance

Alternative Sample Introduction Techniques

Coupling ICP-MS with Chromatographic Techniques for Trace

ICP-MS Applications

Comparing ICP-MS with Other Atomic Spectroscopic Techniques

How to Select an ICP Mass Spectrometer: Some Important Analytical

Considerations

Glossary of ICP-MS Terms

Useful Contact Information